Application of PSI TFN Anti-pollution Membrane in Semiconductor Wastewater Recycling

Anwendung der PSI TFN Anti-Pollution Membrane im Halbleiterabwasser-Recycling

PSI MEMBRANE^® Pro-XFR anti-fouling membrane elements are used in the comprehensive wastewater treatment of semiconductor plants, with the product water reused for production line.

Überblick über das Projekt

Location: Wuxi City, Jiangsu Province
Water Source: A Semiconductor Plant Group
Capacity: RO Permeate Flow Rate 16,416m³/d
User: Semiconductor Industrial Park

Informationen zur Auslegung von Umkehrosmosesystemen

Average Design Flux: 19.05 LMH
RO System Single Unit Design Recovery Rate: 70%
Quantity of Membrane Systems: 6 units
Einführung von Membranelementen: PSI MEMBRANE^® Pro-XFR
Advance pilot testing and compare the performance of other imported membrane elements with significant advantages in anti-pollution PSI MEMBRANE^® Pro-XFR.

System Information

Application of PSI TFN Anti-pollution Membrane in Semiconductor Wastewater Recycling

Parameter	Pressure Vessel Quantity	Per Pressure Vessel Membrane Quantity	Membrane Model	Total Membrane Quantity
1st	17	6	Pro-XFR-8040	102
2nd	9	6	Pro-XFR-8040	54
TDS	mg/L	Around 1600	-	-
Turbidity	NTU	＜5	-	-
F-	mg/L	2.5-3.5	-	-