Japan Kuramoto 2*3 m³/h Ultrapure Water Project

Process: MMF + ACF + 2-Stage RO + EDI + MB + UV + SF
Application: Production of Ultrapure Water for the Semiconductor Industry
Location: Hanaizumi, Japan
Feed Water: Japanese Municipal Tap Water
Feed Water Conductivity: 290 μS/cm & 310 μS/cm
System Recovery Rate: 60%
Maximum Water Consumption: 10 m³/h
Product Water Quality: Resistivity >18 MΩ·cm

Suzhou Suna Optoelectronics 2*11 m³/h Electronic-Grade Ultrapure Water Project

The product water complies with ASTM D5127-07 Type E1.1 standards, featuring extremely low impurity levels. It is specifically designed for high-cleanliness processes in semiconductor chip manufacturing, representing the highest grade of water purity.

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